Application of plasma cleaning in solar photovoltaics:

With the vigorous development of the solar photovoltaic industry, plasma cleaning and surface activation technologies are becoming increasingly widely used in the photovoltaic industry. Plasma cleaning can remove dirt, impurities, and pollutants from the surface of materials; Plasma activation enhances the hydrophilicity, adhesion, and coatability of photovoltaic substrates and component materials. Improve product quality and output, and reduce costs.

1. Glass substrate cleaning: Atmospheric pressure plasma combined with process gases such as nitrogen or argon is used to physically bombard the material surface, remove surface pollutants, and enhance the hydrophilicity of the material surface. After plasma cleaning, the water droplet angle is less than 5 degrees, laying an excellent foundation for subsequent processes such as solder paste printing, dispensing, and coating.

2. Surface modification of ITO anode: Plasma treatment technology is used to modify the surface of ITO anode, which can optimize the chemical composition of the material surface, reduce resistivity, effectively improve energy conversion efficiency, and enhance the photovoltaic performance of components.

3. Pre treatment of protective film coating: Before coating and depositing a silicon nitride protective film with extremely low reflection coefficient on the surface of silicon wafer material, plasma technology is used to treat the silicon wafer surface, which can greatly improve the surface adhesion of silicon wafer material, make the coating more uniform and flat, and enhance the weather resistance and conductivity of photovoltaic devices.